Products
- Sputtering Systems
- Flexlab
- Ion Beam Sputtering
- CVD Systems
- PECVD
- Atomic Layer CVD
- TCPCVD
- Accessories
- Ultrasonic Cleaner
- Hard / Dip Systems
- Dome Oven
- Chiller / Warm Water Unit
Description
Tecport relentlessly strives to develop innovative ideas to improve their product and competitiveness through continuous research and development of new processes, new chemicals, and new instruments.
Flexlab offers the customer the most versatile sputtering system in the market by virtue of its configurable system design. Its flexible design allows the customer to configure the system to perform upstream or downstream, single and multiple layers, and co-deposition.
Flexlab Advantage
Flexible Deposition Methods
Equipped with RF and DC Sputter Source to provide the capability of depositing metallic, inorganic and dielectric organic material.
Sputtering Modes
A combination of four 3” sputter sources, or three 4” sputter sources allows multilayer and co-deposition capability with upstream or downstream sputtering methods.
System Configuration
Automatic load-lock system with compact design and optimization of sputter sources and shutter configuration minimizes cross contamination. Standard on Flexlab Systems.
Specification
| Main Chamber | 304L Stainless Steel Construction, 500 diameter x 460 H (mm), 6” View Port with Shutter |
| Load Lock Chamber | 250W x 250D x 60H (mm), 5” View Port, Ball Bush Slide Unit with Bellow Seal |
| Ultimate Pressure | 10-7 Torr Range |
| Substrate Fixture | 6” Planetary |
| Substrate Rotation | 10 – 60 RPM Magnetic Ferro Seal |
| Substrate Heat | 6” SiC with Max Temperature 650° C |
| Substrate Bios | RF or DC |
| Process Control | Flexlab provides user friendly operating software with data logging, recipe builder, report generation, and remote access capabilities. 15” Touch Screen, PC Based |
| Power Supply | 600W RF Power Supply, 2kW DC Power Supply |
| Sputter Gun | Four 3-inch or Three 4-inch Sputter Guns with Shutters |
| Pumping System | Turbo Pump – 800 l/s, Rotary Pump Main – 970 l/min,
Rotary Pump Load Lock – 300 l/min |
| GAS DELIVERY SYSTEM | MFC - Argon, Oxygen, Nitrogen, Touch Screen MFC Readout |
| PRESSURE GAUGE CONTROL | GP 307 High Pressure: Penning Gauge, Ion Gauge Low Pressure: Pirani Gauge, Convectron Gauge |
| Utility | Electrical: 208/240/50Hz/60Hz/ 50kW 3-phase Water: 20 GPM, Delta 40 PSI @ 21°C Air: Compressed air @ 85-125 PSI |
| Dimension | 1600W x 1500D x 2200H (mm) |
